Journal:
1. Chung-Ting Ko, Yin-Yi Han, Ching-Hsiang Chen, Jay Shieh, and Miin-Jang Chen*, “Enormous plasmonic enhancement and suppressed quenching of luminescence from nanoscale ZnO films by uniformly-dispersed atomic-layer-deposited platinum with optimized spacer thickness,” Journal of Physical Chemistry C, 117, 26204–26212, 2013.
2. Jhih-Jie Huang, Li-Tien Huang, Meng-Chen Tsai, Min-Hung Lee, and Miin-Jang Chen*, “Improvement of Capacitance EquivalentThickness, leakage current, and interfacial state density based on crystallized high-K dielectrics/nitrided buffer layer gate stacks,” ECS Journal of Solid State Science and Technology, 2, P524-P528, 2013. (5 pages)
3. Jui-Fen Chien, Huan-Yu Shih, Hua-Yang Liao, Ray-Ming Lin, Jing-Jong Shyue, and Miin-Jang Chen*, “P-type conductivity of MgZnO:(N:Ga) thin films prepared by remote plasma in-situ atomic layer doping,” ECS Journal of Solid State Science and Technology, 2, R249-R253, 2013. (5 pages)
4.Wei-Cheng Wang, Che-Wei Lin, Hsin-Jui Chen, Che-Wei Chang, Jhih-Jie Huang, Ming-Jui Yang, Budi Tjahjono, Jian-Jia Huang, Wen-Ching Hsu, and Miin-Jang Chen*, “Surface passivation of efficient nanotextured black silicon solar cells using thermal atomic layer deposition,” ACS Applied Materials and Interfaces, 5, 9752−9759, 2013. (8 pages)
5. Jui-Fen Chien, Hua-Yang Liao, Sheng-Fu Yu, Ray-Ming Lin, Makoto Shiojiri, Jing-Jong Shyue, and Miin-Jang Chen*, “Ultraviolet electroluminescence from nitrogen-doped ZnO-based heterojuntion light-emitting diodes prepared by remote plasma in situ atomic layer doping technique,” ACS Applied Materials and Interfaces, 5, 227−232, 2013. (6 pages)
6. Jui-Fen Chien, Yu-Hsun Huang, Yao-Jen Chang, Jing-Jong Shyue, Jer-Ren Yang, and Makoto Shiojiri, and Miin-Jang Chen*, “Tunable optical and structural properties of MgxZn1-xO films prepared by in-situ atomic layer doping technique,” ECS Journal of Solid State Science and Technology, 2, P31-P35, 2013. (5 pages)
7. Li-Tien Huang, Ming-Lun Chang, Jhih-Jie Huang, Chin-Lung Kuo, Hsin-Chih Lin, Ming-Han Liao*, Min-Hung Lee, and Miin-Jang Chen*, “Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2, N2/H2, and NH3 plasma treatments,” Journal of Physics D: Applied Physics, 46, 055103 (5pp), 2013. (5 pages)
8. Li-Tien Huang, Ming-Lun Chang, Jhih-Jie Huang, Hsin-Chih Lin, Chin-Lung Kuo, Min-Hung Lee, Chee-Wee Liu, and Miin-Jang Chen*, “Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma,” Applied Surface Science, 266, 89–93, 2013. (5 pages)
9. P.C. Wang, T.C. Cheng, H.C. Lin*, M.J. Chen*, K.M. Lin, and M. T. Yeh, “Effects of pre-sputtered Al interlayer on the atomic layer deposition of Al2O3 films on Mg-10Li-0.5Zn alloy,” Applied Surface Science, 270, 452–456, 2013. (5 pages)