Journal:
1. Po-Shuan Yang, Po-Hsien Cheng, C. Robert Kao, and Miin-Jang Chen*, “Novel Self-shrinking Mask for Sub-3 nm Pattern Fabrication,” Scientific Reports, 6, 29625, 2016.
2. Wei-Cheng Wang, Meng-Chen Tsai, Yi-Ping Lin, Yi-Jen Tsai, Hsin-Chih Lin,* and Miin-Jang Chen*, “Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure,” Materials Chemistry and Physics, 184, 291-297, 2016.
3. Meng-Chen Tsai, Min-Hung Lee, Chin-Lung Kuo, Hsin-Chih Lin, and Miin-Jang Chen*, “In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics,” Applied Surface Science, 387, 274–279, 2016.
4. Meng-Chen Tsai, Po-Hsien Cheng, Min-Hung Lee, Hsin-Chih Lin*, and Miin-Jang Chen*, “Divergent dielectric characteristics in cascaded high-K gate stacks with reverse gradient bandgap structures,” Journal of Physics D: Applied Physics, 49, 265108 (8pp) 2016.
5. Chun-Ming Lung, Wei-Cheng Wang, Ching-Hsiang Chen, Liang-Yih Chen,* and Miin-Jang Chen*, “ZnO/Al2O3 core/shell nanorods array as excellent anti-reflection layers on silicon solar cells,” Materials Chemistry and Physics, 180, 195-202, 2016.
6. Yung-Chen Cheng, Kai-Yun Yuan, Miin-Jang Chen*, “ZnO thin films prepared by atomic layer deposition at various temperatures from 100 to 180 oC with three-pulsed precursors in every growth cycle,” Journal of Alloys and Compounds, 685, 391-394, 2016
7. Li-Chun Wang, Yin-Yi Han*, Kai-Chiang Yang, Miin-Jang Chen, Hsin-Chih Lin*, Chung-Kwei Lin, Yu-Tong Hsu, “Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC),” Surface & Coatings Technology 305, 158–164, 2016